Lithographic Apparatus for Hologram & Micronano Patterning
A laser pattern generator or direct writing system with SLM technology (spatial light modulator) with 5 axes of motion,
designed to produce precision micropatterns, grayscale lithography on flat or curved surfaces below a rectangle,
so that the minimum spot 'beam shaper' can be achieved sub-wavelength to the exposure phase level of binary
structures, and SLM technology creates powerful micro-pattern generators that can be expanded by combining
high-resolution laser beams and electron beams, such as laser beams and electron beams, for micro-optical devices,
masks, Can be used to make CGH, beam shapers, deflective or refractive lenses and lens arrays.